The Thin Film and Nanostructure Processing Group studies materials at dimensions where the presence and nature of internal and external interfaces substantially impact materials processing or properties. The group uses strengths in electrochemical and vapor phase deposition to develop processes and create structures to quantify the connection between processing, microstructure and properties of nanometer to micrometer dimension materials. The group's technical research is focused in six areas. These are (1) novel thin film media for data storage, (2) advanced on-chip interconnects for microelectronics, (3) wide-bandgap semiconductor nanowires and metallizations, (4) stress evolution and whisker formation in Pb-free coatings, (5) combinatorial fabrication and study of thin films and (6) materials characterization using a variety of high resolution microscopy methods. The group's standards efforts are in the area of thin film measurement, including the thin film SRMs that it manufactures and certifies.
The Thin Film and Nanostructure Processing Group transfers technology to industry through on-site presentations as well as journal publications and presentations at technical conferences.
The Thin Film and Nanostructure Processing Group also manages the MSEL Electron Microscopy Facility jointly with the Ceramics Division.
| Group Leader: | Dr. Daniel Josell | |
| Group Secretary: | Ms. Shari L. Tobery | |
| Mr. Carlos R. Beauchamp | ||
| Dr. Leonid A. Bendersky | ||
| Dr. John E. Bonevich |  Holography | |
| Ms. Sandra W. Claggett | ||
| Dr. Albert V. Davydov | ||
| Ms. Hilary B. Gates | ||
| Dr. Jason Hattrick-Simpers | ||
| Mr. David R. Kelley | ||
| Dr. Thomas P. Moffat | ||
| Ms. Linda Souders | ||
| Dr. Gery R. Stafford | ||
| Group Address: | National Institute of Standards and Technology 100 Bureau Drive, Stop 8551 Gaithersburg, MD 20899 |